Photopolymer Additive Manufacturing Alliance

Log in

PHOTOPOLYMER ADDITIVE MANUFACTURING ALLIANCE

Alliance Overview and Opportunities for Photopolymer Materials and Systems Characterization

November 17-18, 2021, 1:00 PM – 3:00 PM EDT (Virtual)

WEDNESDAY, NOVEMBER 17

Material Characterization Panel

This panel that will provide an open discussion regarding the state-of-the-art in the tools and methods to characterize PAM materials. Panelists include:

Jeff Stansbury, University of Colorado Denver Anschutz (Technical Leader)
Stephanie Benight, Tactile Material Solutions
Jeff Klang, Arkema
H. Jerry Qi, Georgia Institute of Technology

Moderators:

Jason Killgore, NIST
Mike Idacavage, Radical Curing

Recorded Panel Video

THURSDAY, NOVEMBER 18

System Characterization Panel

This panel will provide an open discussion regarding the state-of-the-art in the tools and methods to characterize PAM systems. Panelists include:

Maxim Shusteff, Lawrence Livermore National Laboratory (Technical Leader)
Robert McLeod, University of Colorado Boulder
David Walker, Azul3D
Cameron Miller, NIST
Xiayun Zhao, University of Pittsburgh

Moderators:

Callie Higgins, NIST
Dianne Poster, NIST

Recorded Panel Video

RadTech International North America | The Association for Ultraviolet and Electron Beam Technologies
6935 Wisconsin Ave, Suite 207, Chevy Chase, MD 20815 | (240) 497-1242 | uveb@radtech.org

Powered by Wild Apricot Membership Software